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Su Min Hwang
Su Min Hwang
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Year
A Comprehensive Study on the Effect of TiN Top and Bottom Electrodes on Atomic Layer Deposited Ferroelectric Hf0.5Zr0.5O2 Thin Films
SJ Kim, J Mohan, HS Kim, SM Hwang, N Kim, YC Jung, A Sahota, K Kim, ...
Materials 13 (13), 2968, 2020
442020
Effect of hydrogen derived from oxygen source on low-temperature ferroelectric TiN/Hf0. 5Zr0. 5O2/TiN capacitors
SJ Kim, J Mohan, HS Kim, J Lee, SM Hwang, D Narayan, JG Lee, ...
Applied Physics Letters 115 (18), 2019
342019
Investigation of the physical properties of plasma enhanced atomic layer deposited silicon nitride as etch stopper
HS Kim, X Meng, SJ Kim, AT Lucero, L Cheng, YC Byun, JS Lee, ...
ACS applied materials & interfaces 10 (51), 44825-44833, 2018
332018
Hollow cathode plasma-enhanced atomic layer deposition of silicon nitride using pentachlorodisilane
X Meng, HS Kim, AT Lucero, SM Hwang, JS Lee, YC Byun, J Kim, ...
ACS applied materials & interfaces 10 (16), 14116-14123, 2018
332018
Low-thermal-budget (300° C) ferroelectric TiN/Hf0. 5Zr0. 5O2/TiN capacitors realized using high-pressure annealing
SJ Kim, YC Jung, J Mohan, HJ Kim, SM Rho, MS Kim, JG Yoo, HR Park, ...
Applied Physics Letters 119 (24), 2021
262021
Low temperature thermal atomic layer deposition of aluminum nitride using hydrazine as the nitrogen source
YC Jung, SM Hwang, DN Le, ALN Kondusamy, J Mohan, SW Kim, JH Kim, ...
Materials 13 (15), 3387, 2020
202020
Inductively coupled plasma reactive ion etching of magnetic tunnel junction stacks in a CH3COOH/Ar gas
AA Garay, JH Choi, SM Hwang, CW Chung
ECS Solid State Letters 4 (10), P77, 2015
182015
High density plasma reactive ion etching of Ru thin films using non-corrosive gas mixture
SM Hwang, AA Garay, WI Lee, CW Chung
Thin Solid Films 587, 28-33, 2015
142015
Inductively coupled plasma reactive ion etching of CoFeB magnetic thin films in a CH3COOH/Ar gas mixture
AA Garay, SM Hwang, JH Choi, BC Min, CW Chung
Vacuum 119, 151-158, 2015
132015
Plasma-Enhanced Atomic-Layer Deposition of Nanometer-Thick SiNx Films Using Trichlorodisilane for Etch-Resistant Coatings
SM Hwang, HS Kim, DN Le, AV Ravichandran, A Sahota, J Lee, YC Jung, ...
ACS Applied Nano Materials 4 (3), 2558-2564, 2021
122021
Inductive couple plasma reactive ion etching characteristics of TiO2 thin films
AA Garay, SM Hwang, CW Chung
Thin Solid Films 587, 20-27, 2015
112015
Dry etching of Co2MnSi magnetic thin films using a CH3OH/Ar based inductively coupled plasma
AA Garay, SM Hwang, CW Chung
Vacuum 111, 19-24, 2015
112015
High growth rate and high wet etch resistance silicon nitride grown by low temperature plasma enhanced atomic layer deposition with a novel silylamine precursor
HS Kim, SM Hwang, X Meng, YC Byun, YC Jung, AV Ravichandran, ...
Journal of Materials Chemistry C 8 (37), 13033-13039, 2020
102020
Etch characteristics of CoFeB thin films and magnetic tunnel junction stacks in a H2O/CH3OH plasma
SM Hwang, A Garay, IH Lee, CW Chung
Korean Journal of Chemical Engineering 31, 2274-2279, 2014
102014
Robust low-temperature (350° C) ferroelectric Hf0. 5Zr0. 5O2 fabricated using anhydrous H2O2 as the ALD oxidant
YC Jung, JH Kim, H Hernandez-Arriaga, J Mohan, SM Hwang, DN Le, ...
Applied Physics Letters 121 (22), 2022
92022
Etch characteristics of MgO thin films in Cl2/Ar, CH3OH/Ar and CH4/Ar plasmas
IH Lee, TY Lee, SM Hwang, CW Chung
Vacuum 101, 394-398, 2014
92014
Atomic layer deposition and its derivatives for extreme ultraviolet (EUV) photoresist applications
DN Le, T Park, SM Hwang, JH Kim, YC Jung, N Tiwale, A Subramanian, ...
Japanese Journal of Applied Physics 62 (SG), SG0812, 2023
82023
Chemical reactions induced by low-energy electron exposure on a novel inorganic-organic hybrid dry EUV photoresist deposited by molecular atomic layer deposition (MALD)
DN Le, SM Hwang, J Woo, S Choi, T Park, JF Veyan, N Tiwale, ...
International Conference on Extreme Ultraviolet Lithography 2022 12292, 27-32, 2022
82022
Relaxation Induced by Imprint Phenomena in Low-Temperature (400 °C) Processed Hf0.5Zr0.5O2-Based Metal-Ferroelectric-Metal Capacitors
J Mohan, YC Jung, H Hernandez-Arriaga, JH Kim, T Onaya, A Sahota, ...
ACS Applied Electronic Materials 4 (4), 1405-1414, 2022
82022
Ozone based high-temperature atomic layer deposition of SiO2 thin films
SM Hwang, Z Qin, HS Kim, A Ravichandran, YC Jung, SJ Kim, J Ahn, ...
Japanese Journal of Applied Physics 59 (SI), SIIG05, 2020
72020
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