| GaAs interfacial self-cleaning by atomic layer deposition CL Hinkle, AM Sonnet, EM Vogel, S McDonnell, GJ Hughes, M Milojevic, ... Applied Physics Letters 92 (7), 2008 | 492 | 2008 |
| Conformal Al2O3 dielectric layer deposited by atomic layer deposition for graphene-based nanoelectronics B Lee, SY Park, HC Kim, KJ Cho, EM Vogel, MJ Kim, RM Wallace, J Kim Applied Physics Letters 92 (20), 2008 | 365 | 2008 |
| Ozone adsorption on graphene: ab initio study and experimental validation G Lee, B Lee, J Kim, K Cho arXiv preprint arXiv:0906.2243, 2009 | 222 | 2009 |
| Comparison of the sputter rates of oxide films relative to the sputter rate of DR Baer, MH Engelhard, AS Lea, P Nachimuthu, TC Droubay, J Kim, ... Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 28 (5 …, 2010 | 164 | 2010 |
| Atomic layer deposition of dielectrics on graphene using reversibly physisorbed ozone S Jandhyala, G Mordi, B Lee, G Lee, C Floresca, PR Cha, J Ahn, ... ACS nano 6 (3), 2722-2730, 2012 | 161 | 2012 |
| Characteristics of high-k Al2O3 dielectric using ozone-based atomic layer deposition for dual-gated graphene devices B Lee, G Mordi, MJ Kim, YJ Chabal, EM Vogel, RM Wallace, KJ Cho, ... Applied Physics Letters 97 (4), 2010 | 152 | 2010 |
| Frequency dispersion reduction and bond conversion on n-type GaAs by in situ surface oxide removal and passivation CL Hinkle, AM Sonnet, EM Vogel, S McDonnell, GJ Hughes, M Milojevic, ... Applied Physics Letters 91 (16), 2007 | 127 | 2007 |
| A novel thermally-stable zirconium amidinate ALD precursor for ZrO2 thin films B Lee, KJ Choi, A Hande, MJ Kim, RM Wallace, J Kim, Y Senzaki, ... Microelectronic engineering 86 (3), 272-276, 2009 | 94 | 2009 |
| Electrical properties of atomic-layer-deposited La2O3 films using a novel La formamidinate precursor and ozone B Lee, TJ Park, A Hande, MJ Kim, RM Wallace, J Kim, X Liu, JH Yi, H Li, ... Microelectronic engineering 86 (7-9), 1658-1661, 2009 | 61 | 2009 |
| The effect of graphite surface condition on the composition of Al2O3 by atomic layer deposition A Pirkle, S McDonnell, B Lee, J Kim, L Colombo, RM Wallace Applied Physics Letters 97 (8), 2010 | 55 | 2010 |
| Effects of surface treatment on work function of ITO (Indium Tin Oxide) films C Kim, B Lee, HJ Yang, HM Lee, JG Lee, H Shin Journal of the Korean Physical Society 47 (9), 417, 2005 | 47 | 2005 |
| In situ study of surface reactions of atomic layer deposited LaxAl2− xO3 films on atomically clean In0. 2Ga0. 8As FS Aguirre-Tostado, M Milojevic, B Lee, J Kim, RM Wallace Applied Physics Letters 93 (17), 2008 | 40 | 2008 |
| Effects of O3 and H2O oxidants on C and N-related impurities in atomic-layer-deposited La2O3 films observed by in situ x-ray photoelectron spectroscopy TJ Park, P Sivasubramani, BE Coss, HC Kim, B Lee, RM Wallace, J Kim, ... Applied Physics Letters 97 (9), 2010 | 29 | 2010 |
| Atomic-layer-deposited Al2O3 as gate dielectrics for graphene-based devices B Lee, G Mordi, T Park, L Goux, YJ Chabal, K Cho, EM Vogel, M Kim, ... ECS Transactions 19 (5), 225, 2009 | 19 | 2009 |
| Measurement and visualization of doping profile in silicon using Kelvin probe force microscopy (KPFM) H Shin, B Lee, C Kim, H Park, D Min, J Jung, S Hong, S Kim Electronic Materials Letters 1 (2), 127-133, 2005 | 16 | 2005 |
| Local work function measurements on various inorganic materials using kelvin probe force spectroscopy CH Kim, CD Bae, KH Ryu, BK Lee, HJ Shin Solid State Phenomena 124, 607-610, 2007 | 13 | 2007 |
| ALD of LaHfOx nano-laminates for high-κ gate dielectric applications B Lee, A Hande, TJ Park, KJ Chung, J Ahn, M Rousseau, D Hong, H Li, ... Microelectronic engineering 88 (12), 3385-3388, 2011 | 11 | 2011 |
| Surface energy induced patterning of organic and inorganic materials on heterogeneous Si surfaces L Tao, A Crouch, F Yoon, BK Lee, JS Guthi, J Kim, J Gao, W Hu Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2007 | 10 | 2007 |
| Piezoelectric effect in epitaxial PbZr1− xTixO3 thin films near morphotropic phase boundary region YK Kim, SS Kim, B Lee, H Shin, S Baik Journal of materials research 20 (4), 787-790, 2005 | 9 | 2005 |
| In situ electrical studies of ozone based atomic layer deposition on graphene S Jandhyala, G Mordi, B Lee, J Kim ECS Transactions 45 (4), 39, 2012 | 8 | 2012 |
Robert M. WallaceUniversity of Texas at DallasVerified email at utdallas.edu
